Workshop on digital prints

Contemporary Photography: Digital Prints New York City
27 February - 1 March, 2007
A Collaborative Workshop in Photograph Conservation

Description: This three-day workshop will focus on the materials,
identification, and stability of digital prints. Digital
preservation and time-based media will be touched upon. The aim of
the workshop is to provide conservators with the knowledge and tools
to handle the issues surrounding the acquisition and conservation of
prints made from digital files, as well as an understanding for the
trends in imaging technology and artists' use of modern photographic
printing techniques. Questions of process terminology and current
definitions of the terms "digital print" and "photograph" will be
discussed.

The workshop will be held in New York City, U.S.A., with the support
of the Metropolitan Museum of Art and New York University's Moving
Image Archiving and Preservation program (NYU's MIAP). Designed and
taught by Franziska Frey of Rochester Institute of Technology and
Martin Juergens, Conservator in Private Practice in Hamburg,
Germany, it will include leading experts in art, science, and
conservation. Frey and Juergens are noted experts on the issues of
testing, stability, standards, preservation, identification, and
conservation of digital prints and electronic files. Frey will cover
the intricacies of the many printing processes currently in vogue.
Lectures and brief hands-on sessions with Juergens will improve
participants' identification abilities. Scott Williams of the
Rochester Institute of Technology will provide an introduction to
the chemistry of digital printing. Issues related to the stability
of materials and current testing practices will be covered by Rita
Hofmann of Ilford Switzerland. A panel of artists and curators will
explore the changes the introduction of digital media has brought to
image creation, preservation and collecting.

Eligibility: The Workshop is open to professionals responsible for
the care of digital prints. Enrollment is limited. Participants will
be accepted on a first-come-first-serve basis.

Application Procedure: Applicants should submit a letter of interest
and commitment, and a curriculum vitae to Elaine Johnson at the
University of Delaware (see below). The applicant's letter should
describe why participation in this workshop is important to their
educational and professional goals and how it has direct application
to their day-to-day work. Prior experience with the topic or lack
thereof should be noted as well as opportunities for dissemination
of information gained. Limited financial aid will be awarded on the
basis of need and may include some contribution to defray basic
travel expenses. A separate statement indicating the reasons for
financial assistance and a basic budget should be submitted as part
of the application. There is no fee for this workshop.

Applications should be submitted as soon as possible to:

    Mellon Collaborative Course
    c/o ejonsonc [at] udel__edu or
    c/o Art Conservation Department
    303 Old College
    University of Delaware
    Newark, DE 19716, USA

Registration will close when the participant limit is reached. Any
questions should be directed to

    Elaine Johnson
    302-831-0837
    ejonsonc [at] udel__edu


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                  Conservation DistList Instance 20:29
                Distributed: Thursday, November 30, 2006
                       Message Id: cdl-20-29-019
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